THIN-FILM PREPARATION OF OLIGOMERIC SI-PHTHALOCYANINES - THERMAL-STABILITY AND SUBLIMATION BEHAVIOR

Authors
REUSCH B ZIEGLER C KWAG TG KENNEY ME GOPEL W
Citation
B. Reusch et al., THIN-FILM PREPARATION OF OLIGOMERIC SI-PHTHALOCYANINES - THERMAL-STABILITY AND SUBLIMATION BEHAVIOR, Thin solid films, 299(1-2), 1997, pp. 63-66
Citations number
6
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
299
Issue
1-2
Year of publication
1997
Pages
63 - 66
Database
ISI
SICI code
0040-6090(1997)299:1-2<63:TPOOS->2.0.ZU;2-S
Abstract
The thermal stability of rod-like phthalocyanines of the general formu la R3SiO(SiPcO)(n)SiR3 with n = 1-4 and R = C6H13 was studied by tempe rature dependent mass spectrometry and X-ray photoemission spectroscop y. The stability of the monomer, dimer, and trimer is high, whereas th e tetramer is thermally unstable and therefore cannot be used for thin film preparation by sublimation. (C) 1997 Elsevier Science S.A.