P. Williams et al., MICROSTRUCTURE AND PHOTOLUMINESCENCE OF POROUS SI FORMED ON N-TYPE SUBSTRATES IN THE DARK, Thin solid films, 298(1-2), 1997, pp. 66-75
The microstructure, from the general morphology to the lattice structu
re, of porous Si layers produced by electrochemical etching of highly
doped n-type Si substrates in obscurity conditions was studied by scan
ning and transmission electron microscopies. Scanning electron microsc
opy revealed that the porous layer consists of two distinctive layers,
characterised by the size of the observed structural features: an upp
er mesoporous layer and a lower macroporous layer. High resolution ele
ctron microscopy showed the presence of thin crystalline Si platelets
held at various depths within the pores of the mesoporous layer, in co
ntrast to the Si nanocrystallites and nanowires identified in previous
studies. In spite of the different geometry of the nanoparticles resu
lting from the obscurity conditions, the observed photoluminescence wa
s that of the typical red band. (C) 1997 Elsevier Science S.A.