The microstructural analysis of SiC nanorods by high-resolution electron microscopy

Citation
Yh. Gao et al., The microstructural analysis of SiC nanorods by high-resolution electron microscopy, J ELEC MICR, 49(5), 2000, pp. 641-649
Citations number
17
Categorie Soggetti
Multidisciplinary
Journal title
JOURNAL OF ELECTRON MICROSCOPY
ISSN journal
00220744 → ACNP
Volume
49
Issue
5
Year of publication
2000
Pages
641 - 649
Database
ISI
SICI code
0022-0744(2000)49:5<641:TMAOSN>2.0.ZU;2-9
Abstract
beta-sic nanorods have been synthesized by the reaction of SiO and carbon n ano-capsules. For the synthesis of SiC nanorods, it was examined that the r eaction temperature and the ratio of SiO to carbon nanocapsules are importa nt and the most appropriate temperature and ratio are around 1380 degrees C and 5:2, respectively. The synthesized SiC nanorods were characterized by high-resolution electron microscopy. Most of the SiC nanorods are straight and have the diameter of 30-150 nm while the SiC tips of the SiC nanorods h ave the size 100-400 nm. The SiC nanorods have many stacking faults normal to the [111] direction. Each SIC nanorod has one kind of preferential axis direction, which is either parallel or normal to the [111] direction. Based on the microstructural analysis of the SiC nanorods, a possible growth mec hanism of the SiC nanorods is proposed.