Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator

The electron temperature and ion density produced by a microfabricated plas ma generator are characterized in both argon gas and air. The plasma genera tor sustains a discharge by inductively coupling 450 MHz rf power into a sm all (10 mm diameter) vacuum chamber. The inductively coupled plasma source is surface micromachined on a glass wafer by electroplating a planar spiral inductor and two interdigitated capacitors. A plasma can be sustained usin g gas pressures between 0.1 and 10 Torr and rf powers between 0.3 and 3 W. The ion density increases from 10(10) to 10(11) cm(-3) over this range of p ower. The electron temperature decreases from 4 to 2 eV as the pressure inc reases from 0.1 to 1 Torr. (C) 2000 American Vacuum Society. [S0734-211X(00 )01405-0].