In this article, a thin tensile GaAs interlayer was used to get narrower si
ze distribution and regular arrangement of InAs quantum dots (QDs) on InP s
ubstrate by low-pressure metalorganic chemical vapor deposition. The compar
ison results of thr: photoluminescence spectrum and the atomic force micros
copy image show better properties after using GaAs interlayer. Also investi
gated were the surface behaviors of InAs QDs with different InAs coverage o
n GaAs/InP in order to reveal the detailed information of InAs QDs. (C) 200
0 American Vacuum Society. [50734-211X(00)02205-8].