The growth of bismuth on Ge(001) has been studied using scanning tunne
ling microscopy. Deposition of one-monolayer (ML) Bi at room temperatu
re and subsequent annealing at 500 K results in the formation of a wel
l-ordered (2 x n) vacancy line network oriented perpendicular to the d
imer rows. Deposition of two-monolayer Bi under the same conditions re
sults in the formation of square-shaped pits with depths up to 10 ML.
The edges of these pits run along the two dimer row directions. Carefu
l analysis of these pits reveal that they mainly consist of (111) and
(113) facets. We argue that the morphological transition from the vaca
ncy line network to the square shaped pits pattern is driven by a modi
fication of the surface strain tenser. (C) 1997 Elsevier Science B.V.