Characterization of the element distribution within TiN coatings with SIMS

The distribution of the relevant elements within TiN coatings, made with tw o different physical deposition methods as the conventional de vacuum are m ethod and the filtered high current pulsed are method (Phi -HCA) are charac terized and finally compared. Despite the rougher surface of the dc-arc pro duced TiN layer, which is due to accumulated droplets, there is no evidence of different stoechiometric composition of Ti and N on the surface. The in terface of the de-are produced TiN layer (600 nm) is 10 times wider than th e one made with the new filtered high current pulsed are method (60 nm), Ho wever the TiN layer made by Phi -HCA shows an inhomogeneous distribution of aluminum and chlorine in the vertical direction, whereas the de-are sample is homogeneous. Furthermore, the TiN layer made by Phi -HCA shows vertical ly an obvious local maximum of chlorine at a depth of about 130 nm. This ve rtical local maximum has an homogeneous distribution in horizontal directio n, which means that a thin, chlorine enriched layer has been incorporated i nside the TiN layer. Nevertheless, quantification by SIMS show's that alumi num as well as chlorine concentrations of both samples are too low to influ ence any TIN properties.