Quantum well intermixing of In1-xGaxAs/InP and In1-xGaxAs/InP and In1-xGaxAs/In1-xGaxAs1-yPy multiple-quantum-well structures by using the impurity-free vacancy diffusion technique

Citation
Hs. Kim et al., Quantum well intermixing of In1-xGaxAs/InP and In1-xGaxAs/InP and In1-xGaxAs/In1-xGaxAs1-yPy multiple-quantum-well structures by using the impurity-free vacancy diffusion technique, SEMIC SCI T, 15(10), 2000, pp. 1005-1009
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
15
Issue
10
Year of publication
2000
Pages
1005 - 1009
Database
ISI
SICI code
0268-1242(200010)15:10<1005:QWIOIA>2.0.ZU;2-O
Abstract
We investigated the influence of strain and barrier composition on the quan tum well intermixing (QWI) in In1-xGaxAs/In1-xGaxAs1-yPy multiple-quantum-w ell (MQW) structures by using the impurity-free vacancy diffusion technique . A compressively strained MQW structure showed a higher degree of intermix ing than a lattice-matched one due to lower thermal stability and larger ba ndgap difference between the quantum well (QW) and the barrier. Also, the p hotoluminescence blueshift increases with increasing difference of bandgap energy between the QW and the barrier. In addition, a highly selective QWI with a large bandgap shift difference of 123 meV (195 nm) using an identica l silica cap has been achieved from samples capped with InGaAs/SiO2 and InP /SiO2 capping layers. This behaviour may be attributed to the difference in thermal expansion coefficient between InGaAs and InP at the annealing temp erature.