Cerium (IV) oxide films were deposited on silicon substrates by nebulizatio
n of a 0.01 M solution of cerium acetylacetonate in a 50% ethanol-water mix
ture followed by pyrolysis in flowing air. The films were characterized by
X-ray diffraction, scanning electron microscopy and atomic force microscopy
. On the basis of the experimental evidence, the technical conditions were
selected. Appropriate control of the ratio of pulse time to interval time w
as found to be necessary for obtaining high quality and greater crystallite
size cerium (IV) oxide thin films. (C) 2000 Published by Elsevier Science
B.V.