Specific features of the kinetics of the chemical etching of poly(ethyleneterephthalate) films irradiated with xenon ions

Citation
Te. Laricheva et al., Specific features of the kinetics of the chemical etching of poly(ethyleneterephthalate) films irradiated with xenon ions, COLL J, 62(5), 2000, pp. 575-578
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
COLLOID JOURNAL
ISSN journal
1061933X → ACNP
Volume
62
Issue
5
Year of publication
2000
Pages
575 - 578
Database
ISI
SICI code
1061-933X(200009/10)62:5<575:SFOTKO>2.0.ZU;2-M
Abstract
The kinetics of the alkaline etching of poly(ethylene terephthalate) films irradiated with xenon ions with the energy of 1 MeV per nucleon is investig ated. It was established that preliminary (prior to etching) film annealing in the air and swelling in water substantially affect the etching kinetics due to various adsorption, desorption, and diffusion processes in latent t racks of ions in the polymer. The tritium tracer method showed that water p enetrating into the latent tracks exerts a plasticizing effect on the destr ucted polymeric material, which contributes to its contraction and provides the involvement of both the polymer surface and some portion of the volume of latent tracks into the etching zone.