Citation
Sh. Yang et al., Simulated annealing optimization algorithm for inverting ellipsometric spectra, J INF M W, 19(5), 2000, pp. 338-342
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF INFRARED AND MILLIMETER WAVES
ISSN journal
10019014
→ ACNP
Volume
19
Issue
5
Year of publication
2000
Pages
338 - 342
Database
ISI
SICI code
1001-9014(200010)19:5<338:SAOAFI>2.0.ZU;2-S
Abstract
The simulated annealing (SA) optimization algorithm was used to invert elli
psometric spectra. The thickness and the optical constants spectra of the s
amples can be obtained simultaneously by this method. The adopted SA method
was described in detail. As examples of application, calculated results of
thickness and optical constants spectra of SiO2 films and Ba0.9Sr0.1TiO3(B
ST) ferroelectric films on Si substrate were given. The sensitivities in ps
i and Delta with respect to the refractive index and the thickness of the f
ilm were also discussed.