UV-specific (320-365 nm) digital camera based on a 128x128 focal plane array of GaN/AlGaN p-i-n photodiodes

Citation
Jd. Brown et al., UV-specific (320-365 nm) digital camera based on a 128x128 focal plane array of GaN/AlGaN p-i-n photodiodes, MRS I J N S, 5(6), 2000, pp. 1-12
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Issue
6
Year of publication
2000
Pages
1 - 12
Database
ISI
SICI code
1092-5783(2000)5:6<1:U(NDCB>2.0.ZU;2-P
Abstract
An ultraviolet-specific (320-365 nm) digital camera based on a 128x128 arra y of backsideilluminated GaN/AlGaN p-i-n photodiodes has been successfully developed. The diode structure consists of a base n-type layer of AlGaN (si milar to 23% Al) followed by undoped and then p-type GaN layers deposited b y metal organic vapor phase epitaxy. Double-side polished sapphire wafers s erve as transparent substrates. Standard photolithographic, etching, and me tallization procedures were employed to fabricate the devices. The fully-pr ocessed photodiode array was hybridized to a silicon readout integrated cir cuit (ROIC) using In bump bonds for electrical contact. The UV camera was o perated at room temperature at frame rates ranging from 15 to 240 Hz. A var iety of UV scenes were successfully recorded with this configuration.