Jd. Brown et al., UV-specific (320-365 nm) digital camera based on a 128x128 focal plane array of GaN/AlGaN p-i-n photodiodes, MRS I J N S, 5(6), 2000, pp. 1-12
An ultraviolet-specific (320-365 nm) digital camera based on a 128x128 arra
y of backsideilluminated GaN/AlGaN p-i-n photodiodes has been successfully
developed. The diode structure consists of a base n-type layer of AlGaN (si
milar to 23% Al) followed by undoped and then p-type GaN layers deposited b
y metal organic vapor phase epitaxy. Double-side polished sapphire wafers s
erve as transparent substrates. Standard photolithographic, etching, and me
tallization procedures were employed to fabricate the devices. The fully-pr
ocessed photodiode array was hybridized to a silicon readout integrated cir
cuit (ROIC) using In bump bonds for electrical contact. The UV camera was o
perated at room temperature at frame rates ranging from 15 to 240 Hz. A var
iety of UV scenes were successfully recorded with this configuration.