Internal microstrain and distribution of composition and cathodoluminescence over lapped Al(x)Ga(1-x)Nepilayers on sapphire

Citation
As. Usikov et al., Internal microstrain and distribution of composition and cathodoluminescence over lapped Al(x)Ga(1-x)Nepilayers on sapphire, SEMICONDUCT, 34(11), 2000, pp. 1248-1254
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
34
Issue
11
Year of publication
2000
Pages
1248 - 1254
Database
ISI
SICI code
1063-7826(2000)34:11<1248:IMADOC>2.0.ZU;2-S
Abstract
Structural properties and spatial inhomogeneity of MOCVD-grown AlxGa1- xN l ayers on (0001) sapphire substrates were studied. A nonuniform distribution of Al across the epilayer was observed in layers grown at constant flux ra tes of precursors. The model of compositionally graded layer formation is p roposed on the basis of cathodoluminescence and X-ray data. It is establish ed that homogeneous samples can be obtained by increasing the flux rate of trimethylaluminum at the initial stage of epilayer growth compared with tha t in all further stages. Lowering the growth rate reduces strain in epitaxi al AlxGa1- xN layers. The influence of strain on the luminescence propertie s of the layers is discussed. (C) 2000 MAIK "Nauka/ Interperiodica".