Photoresponse and electroluminescence of silicon-< porous silicon >-< chemically deposited metal > structures

Citation
Lv. Belyakov et al., Photoresponse and electroluminescence of silicon-< porous silicon >-< chemically deposited metal > structures, SEMICONDUCT, 34(11), 2000, pp. 1334-1337
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
34
Issue
11
Year of publication
2000
Pages
1334 - 1337
Database
ISI
SICI code
1063-7826(2000)34:11<1334:PAEOSP>2.0.ZU;2-K
Abstract
Photoelectric and electroluminescent properties of silicon-< porous silicon > structures with chemically deposited metal contacts were investigated. T he large specific surface area of the contact and selective metal depositio n only on the macrocrystalline elements of the structure provide better pho toelectric performance of the photodiodes compared to the structures with e vaporated contacts, especially in the short-wavelength spectral range. The obtained electroluminescence spectra are explained by metal-silicon barrier properties under forward bias and by double carrier injection into nanocry stallites under reverse bias. (C) 2000 MAIK "Nauka/Interperiodica".