Microstructure and optical properties of amorphous and crystalline PbZrO3 thin films grown on Si(100) substrates by a sol-gel process

Citation
Xg. Tang et al., Microstructure and optical properties of amorphous and crystalline PbZrO3 thin films grown on Si(100) substrates by a sol-gel process, SOL ST COMM, 116(9), 2000, pp. 507-511
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
116
Issue
9
Year of publication
2000
Pages
507 - 511
Database
ISI
SICI code
0038-1098(2000)116:9<507:MAOPOA>2.0.ZU;2-X
Abstract
Amorphous and crystalline PbZrO3 thin films deposited on Si(100) substrate have been prepared by a sol-gel process. The crystal structure and surface morphologies of the thin films have been studied by X-ray diffraction and a tomic force microscopy. The crystalline PbZrO3 film on Si(100) substrate is a pseudocubic structure with a (111) orientation. The refractive index II and extinction coefficient k of the amorphous and crystalline thin films we re obtained by spectroscopic ellipsometry as a function of the photon energ y in the range from 2.0 to 5.4 eV. The absorption edges for amorphous and c rystalline PbZrO3 thin films are 4.07 and 3.63 eV, respectively. The absorp tion edge of the amorphous PbZrO3 film shift to high energy is mainly due t o the quantum-size effect. (C) 2000 Elsevier Science Ltd. All rights reserv ed.