NiO/Pd epitaxial superlattices were successfully grown by a reactive evapor
ation method and their structures were studied by various X-ray diffraction
(XRD) methods. We prepared (111) oriented films and (100) oriented films o
n alpha -Al2O3(00.1) and MgO(100) substrates, respectively. The XRD pattern
s of 2 theta/theta scans were analyzed by an extended step model calculatio
n. In-plane alignment was investigated by pole figure method and reciprocal
space mapping. The specimens can be epitaxially grown up to a certain thic
kness of the NiO layer t(NiO) [t(NiO) less than or equal to 20 Angstrom for
(111) oriented film and t(NiO) less than or equal to 10 Angstrom for (100)
oriented film] with the lattice shrinking of the NiO of approximately 10%.
On the other hand, those beyond the critical thickness have texture struct
ure with the lattice spacing of bulk NiO. (C) 2000 Elsevier Science S.A. Al
l rights reserved.