Deposition and characterization of PMNT thin films

Citation
A. Fundora et Jm. Siqueiros, Deposition and characterization of PMNT thin films, THIN SOL FI, 373(1-2), 2000, pp. 60-63
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
373
Issue
1-2
Year of publication
2000
Pages
60 - 63
Database
ISI
SICI code
0040-6090(20000903)373:1-2<60:DACOPT>2.0.ZU;2-H
Abstract
The system Pb[(Mg1/3Nb2/3)(0.90)Ti-0.03]O-3 (PMNT) is classified as a relax er ferroelectric material, paraelectric at room temperature. Ceramics of th is compound were used as targets to produce thin films by pulsed laser depo sition (PLD). A KrF excimer laser with lambda = 248 nm, a fluence of 2 J/cm (2) and 10 Hz repetition rate was used for the deposits on TiN/SiO2/Si(100) substrates. Well adhered and uniform thickness films were obtained showing no evidence of as-deposited crystallinity, X-Ray Diffraction studies showe d the development of microcrystalline structure with annealing starting at 500 degreesC, evidenced also by scanning electron microscopy (SEM). Finally , a correlation between the measured dielectric properties of the films and their microstructure is made. (C) 2000 Elsevier Science S.A. All rights re served.