Deposition of carbon nitride films by reactive sub-picosecond pulsed laserablation

Citation
S. Acquaviva et al., Deposition of carbon nitride films by reactive sub-picosecond pulsed laserablation, THIN SOL FI, 373(1-2), 2000, pp. 266-272
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
373
Issue
1-2
Year of publication
2000
Pages
266 - 272
Database
ISI
SICI code
0040-6090(20000903)373:1-2<266:DOCNFB>2.0.ZU;2-E
Abstract
We have ablated, for the first time, graphite in a nitrogen atmosphere at d ifferent pressures by using a sub-picosecond excimer laser (KrF, lambda = 2 48 nm, tau (L) = 0.5 ps). In this paper, we have discussed the deposited fi lm properties using several diagnostic techniques (scanning electron micros copy, profilometry, X-ray photoelectron spectroscopy, Fourier transform, in frared and Raman spectroscopies) in terms of the different physical mechani sms involved in the reactive laser ablation process when the graphite targe t is ablated in a nitrogen atmosphere by lasers with different pulse durati on. The deposition rate, the nitrogen concentration and the amount of the c arbon bonded to nitrogen atoms were extremely reduced with respect to what was observed in the films deposited by nanosecond lasers. Moreover, the par ticulate and droplet density, one of the worst drawbacks of laser depositio n technique, was not decreased. (C) 2000 Elsevier Science S.A. All rights r eserved.