Near-infrared Yablonovite-like photonic crystals by focused-ion-beam etching of macroporous silicon

Citation
A. Chelnokov et al., Near-infrared Yablonovite-like photonic crystals by focused-ion-beam etching of macroporous silicon, APPL PHYS L, 77(19), 2000, pp. 2943-2945
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
19
Year of publication
2000
Pages
2943 - 2945
Database
ISI
SICI code
0003-6951(20001106)77:19<2943:NYPCBF>2.0.ZU;2-T
Abstract
We report on the fabrication of three-dimensional (3D) Yablonovite-like pho tonic crystals by focused-ion-beam (FIB) etching of macroporous silicon. Cr ystals containing up to 25x25x5 lattice cells are fabricated with a submicr onic period of similar to0.75 mum. Photonic band gaps at wavelengths close to 3 mum are demonstrated from reflection measurements and confirmed by num erical calculations. The combination of plasma or chemical etching with FIB micromachining appears to be promising for the fabrication of a large vari ety of multiple-period 3D photonic crystals at optical wavelengths. (C) 200 0 American Institute of Physics. [S0003-6951(00)00245-X].