Laser-induced fluorescence of OH radicals in a dielectric barrier discharge

Citation
R. Sankaranarayanan et al., Laser-induced fluorescence of OH radicals in a dielectric barrier discharge, APPL PHYS L, 77(19), 2000, pp. 2970-2972
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
19
Year of publication
2000
Pages
2970 - 2972
Database
ISI
SICI code
0003-6951(20001106)77:19<2970:LFOORI>2.0.ZU;2-M
Abstract
We discuss the results of laser-induced fluorescence measurements of OH rad icals in a dielectric-barrier discharge. The discharge is in parallel plate geometry in atmospheric pressure air and argon. Although the air discharge consists of discrete microdischarges, two-dimensional images show the spat ial uniformity of the OH radical. Results show that with increasing power, the OH production decreases due to gas heating and increased ozone producti on. The addition of O-2 increases the OH production at low concentrations; however, at higher O-2 concentration the OH concentration decreases due to increased electron attachment. (C) 2000 American Institute of Physics. [S00 03-6951(00)04245-5].