Effect of repetition rate of a pulsed microwave diamond forming plasma on the density of C-2

Authors
Khachan, J James, BW Marfoure, A
Citation
J. Khachan et al., Effect of repetition rate of a pulsed microwave diamond forming plasma on the density of C-2, APPL PHYS L, 77(19), 2000, pp. 2973-2975
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
19
Year of publication
2000
Pages
2973 - 2975
Database
ISI
SICI code
0003-6951(20001106)77:19<2973:EORROA>2.0.ZU;2-E
Abstract
The relative density of C-2 in a pulsed microwave discharge, used for diamo nd deposition, was measured by optical emission spectroscopy. It was found that the average density of C-2 increases with increasing plasma repetition rate (200 Hz-8 kHz) and approaches a limit at high frequencies. These resu lts are explained with a simple plasma chemical kinetics simulation of the pulsed discharge. (C) 2000 American Institute of Physics. [S0003-6951(00)04 645-3].