Thermoelectric properties of junctions between metal and strongly correlated semiconductor

Citation
M. Rontani et Lj. Sham, Thermoelectric properties of junctions between metal and strongly correlated semiconductor, APPL PHYS L, 77(19), 2000, pp. 3033-3035
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
19
Year of publication
2000
Pages
3033 - 3035
Database
ISI
SICI code
0003-6951(20001106)77:19<3033:TPOJBM>2.0.ZU;2-I
Abstract
We propose a junction of metal and rare-earth compound semiconductor as the basis for a possible efficient low-temperature thermoelectric device. If a n overlayer of rare-earth atoms differing from the bulk is placed at the in terface, very high values of the figure of merit ZT can be reached at low t emperature. This is due to sharp variation of the transmission coefficient of carriers across the junction at a narrow energy range, which is intrinsi cally linked to the localized character of the overlayer f orbital. (C) 200 0 American Institute of Physics. [S0003-6951(00)02545-6].