T. Storgaardlarsen et al., NITROGEN-DOPED GERMANIA GLASSES WITH ENHANCED OPTICAL AND MECHANICAL-PROPERTIES, Journal of the Electrochemical Society, 144(6), 1997, pp. 2137-2142
A new type of ultraviolet photosensitive germanium doped glass has bee
n developed for use in the fabrication of optical waveguide structures
. By adding ammonia to the source gases during a plasma enhanced chemi
cal vapor deposition of these glasses, ultraviolet induced refractive
index changes of up to 3.5 x 10(-3) have been obtained. Although this
is, to the best of our knowledge, a record for germanium doped silica
films not photosensitized by hydrogen loading, our results show that e
ven larger changes in the refractive index can be induced. Stable glas
ses with refractive indexes from 1.460 to 1.518 have been formed throu
ghout the composition range from 0 to 30% germanium by including ammon
ia in the deposition process Not only is it possible to increase the p
hotosensitivity, but it is also possible to control stress in these fi
lms. Depending on the deposition and annealing conditions, these glass
films can be made to exhibit a range of stress from compressive to lo
w tensile when deposited on silicon wafers.