Stress-induced effects by the anodic oxide in ridge waveguide laser diodes

Citation
M. Buda et al., Stress-induced effects by the anodic oxide in ridge waveguide laser diodes, IEEE J Q EL, 36(10), 2000, pp. 1174-1183
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF QUANTUM ELECTRONICS
ISSN journal
00189197 → ACNP
Volume
36
Issue
10
Year of publication
2000
Pages
1174 - 1183
Database
ISI
SICI code
0018-9197(200010)36:10<1174:SEBTAO>2.0.ZU;2-B
Abstract
This paper studies, both theoretically and experimentally, stress-induced e ffects on the lateral far-field behavior for ridge-type semiconductor laser diodes where anodic oxide is used for the definition of the stripe width. These effects consist of antiguiding under the stripe region, and of two po sitive waveguiding features near the stripe edges. For low-threshold device s, these effects may be more important than thermal effects, depending on t he stress in the oxide. They put a lower limit on the built-in index guidin g to be introduced by lateral etch outside the ridge region in order to mai ntain fundamental mode operation for wider stripes. The magnitude of these effects may be as large as Deltan(ef) = 1 x 10(-3).An analytical mathematic al model is deduced for computing stresses and strains for a certain ridge- shaped interface which bounds the elastic medium.