The authors analyze the feasibility of laser action in erbium-doped silicon
devices. The recent experimental results on spontaneous light emission at
1.54 mum from erbium-doped silicon diodes and theoretical calculation on Br
agg grating technology are used to evaluate the best scenario performances.
The effects of processes-induced errors on the threshold conditions are ta
ken into account. They show that laser action in the Er : Si system is feas
ible.