Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodology

A novel one-step cleaning method has been developed for pre-gate-oxide clea ning to replace the conventional RCA two-step cleaning process. Tetramethyl ammonium hydroxide (TMAH) and ethylenediamine tetraacetic acid (EDTA) are added into the RCA SC-1 cleaning solution to enhance cleaning efficiency. W e adapt a robust design methodology (Genichi Taguchi method) to analyze the results of our experiments. Using this novel method, it is found that the optimum conditions are A(1)B(2)C(1)D(1) (A(1): TMAH : NH4OH = 1 : 50, B-2: EDTA concentration is 100 ppm, C-1: cleaning time is 5 min, and D-1: cleani ng temperature is 60 degreesC). This novel one-step cleaning method is very promising for future large-sized silicon wafer cleaning processes because it has the advantages of reduced processing time and temperature, cost redu ction due to reduced chemical usage and improved performance.