Deposition of aligned bamboo-like carbon nanotubes via microwave plasma enhanced chemical vapor deposition

Citation
H. Cui et al., Deposition of aligned bamboo-like carbon nanotubes via microwave plasma enhanced chemical vapor deposition, J APPL PHYS, 88(10), 2000, pp. 6072-6074
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
10
Year of publication
2000
Pages
6072 - 6074
Database
ISI
SICI code
0021-8979(20001115)88:10<6072:DOABCN>2.0.ZU;2-N
Abstract
Aligned multiwall carbon nanotubes have been grown on silicon substrates by microwave plasma enhanced chemical vapor deposition using methane/ammonia mixtures. Scanning electron microscopy shows that the nanotubes are well al igned with high aspect ratio and growth direction normal to the substrate. Transmission electron microscopy reveals that the majority phase has a bamb oo-like structure. Data are also presented showing process variable effects on the size and microstructure of the aligned nanotubes, giving insight in to possible nucleation and growth mechanisms for the process. (C) 2000 Amer ican Institute of Physics. [S0021-8979(00)04923-9].