A comparison between light reflectometry and ellipsometry in the Rayleigh regime

Citation
Rc. Van Duijvenbode et Gjm. Koper, A comparison between light reflectometry and ellipsometry in the Rayleigh regime, J PHYS CH B, 104(42), 2000, pp. 9878-9886
Citations number
30
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHYSICAL CHEMISTRY B
ISSN journal
15206106 → ACNP
Volume
104
Issue
42
Year of publication
2000
Pages
9878 - 9886
Database
ISI
SICI code
1520-6106(20001026)104:42<9878:ACBLRA>2.0.ZU;2-0
Abstract
The adsorption of Rayleigh particles is analyzed in terms of particle radiu s and surface coverage with thin island film theory with both scanning angl e light reflectometry and ellipsometry around the Brewster angle. A compari son between both techniques shows that an additional uniformity parameter c an be extracted out of the experimental reflectivity data. This gives infor mation about the distribution of the adsorbed mass normal to the surface. F ixed angle reflectometry is less sensitive to surface properties than fixed angle ellipsometry. This is closely related to the fact that ellipsometry measurements provide an extra measurable physical quantity, the change in e llipticity at the surface, which has a weaker but different dependence on s urface coverage and layer thickness. This enables ellipsometry to distingui sh between a broad range of combinations of surface coverage and particle r adii that give similar reflectivity. Fixed angle reflectometry can therefor e only lead to an interpretation in terms of adsorbed mass. Scanning angle reflectometry measurements, on the contrary, can easily be interpreted in t erms of surface concentration and thickness and make further ellipsometry m easurements unnecessary.