On a possibility of high-resolution characterization of InGaAs/GaAs multilayers using phase-retrieval x-ray diffractometry technique

Citation
Ay. Nikulin et al., On a possibility of high-resolution characterization of InGaAs/GaAs multilayers using phase-retrieval x-ray diffractometry technique, J PHYS D, 33(20), 2000, pp. 2521-2526
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
33
Issue
20
Year of publication
2000
Pages
2521 - 2526
Database
ISI
SICI code
0022-3727(20001021)33:20<2521:OAPOHC>2.0.ZU;2-4
Abstract
A recently developed new experimental-analytical x-ray diffraction method f or the direct non-destructive characterization of single-crystal alloys is applied to map the complex structure-factor of InGaAs/GaAs multi-quantum we lls. The technique is based on analytical measurements of the x-ray phase a nd amplitude changes in a narrow polychromatic region of synchrotron radiat ion. High-resolution, x-ray Bragg diffraction profiles have been collected at the European Synchrotron Radiation Facility near the absorption edge of Ga. The studies have allowed the observation and preliminary analysis of fi ne structure of nanoscale sublayers, where the crystal structure factor may noticeably differ from the bulk material. These results might allow direct and quantitative analysis of the exact location and nature of relaxation d efects in single-crystal multilayer structures.