Low frequency noise in gate and drain of PHEMT's and related correlation

Citation
Jc. Vildeuil et al., Low frequency noise in gate and drain of PHEMT's and related correlation, MICROEL REL, 40(11), 2000, pp. 1915-1920
Citations number
7
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
40
Issue
11
Year of publication
2000
Pages
1915 - 1920
Database
ISI
SICI code
0026-2714(200011)40:11<1915:LFNIGA>2.0.ZU;2-E
Abstract
Low frequency noise investigations have been carried out in GaAs based psue domorphic high electron mobility in order to model the up-converted noise i n nonlinear applications of these devices. Gate and channel noises are stud ied versus frequency and versus device biases. The results are analysed wit h an equivalent circuit issued from conduction investigations. Correlation between input and output noises is also measured. For V-GS < 0 V, the main origin of the coherence is located between gate and drain, whereas for V-DS > 0 V, the access source resistance must be taken into account. (C) 2000 E lsevier Science Ltd. All rights reserved.