MICROSTRUCTURAL CHANGES IN TLBA2CACU2O7-DELTA THIN-FILMS AFTER REDUCING ANNEALS WHICH ENHANCE CRITICAL-CURRENT DENSITY

Citation
Pp. Newcomer et al., MICROSTRUCTURAL CHANGES IN TLBA2CACU2O7-DELTA THIN-FILMS AFTER REDUCING ANNEALS WHICH ENHANCE CRITICAL-CURRENT DENSITY, IEEE transactions on applied superconductivity, 7(2), 1997, pp. 1887-1890
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
10518223
Volume
7
Issue
2
Year of publication
1997
Part
2
Pages
1887 - 1890
Database
ISI
SICI code
1051-8223(1997)7:2<1887:MCITTA>2.0.ZU;2-1
Abstract
Microstructural changes in TlBa2CaCu2O7-partial derivative (Tl-1212) e pitaxial thin films resulting from low oxygen partial pressure furnace anneals at 600 degrees C are studied using high resolution transmissi on electron microscopy (TEM), These postgrowth anneals have been shown to significantly raise the superconducting transition temperature fro m 70 to 90 K, and greatly improve the magnetic flux pinning and the cr itical current density, Changes occur in both the microstructure and t he morphology of the films that correlate with changes in J(c). Plan v iew TEM and high-resolution cross-sectional TEM analysis of the films before and after anneals demonstrates changes in the lattice fringe im age, overall contrast modulation, and nanometer-scale discontinuities.