IN-SITU FABRICATION OF TL-BASED SUPERCONDUCTING THIN-FILMS BY 2-ZONE RF-SPUTTERING

Citation
Sj. Wang et al., IN-SITU FABRICATION OF TL-BASED SUPERCONDUCTING THIN-FILMS BY 2-ZONE RF-SPUTTERING, IEEE transactions on applied superconductivity, 7(2), 1997, pp. 1891-1894
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
10518223
Volume
7
Issue
2
Year of publication
1997
Part
2
Pages
1891 - 1894
Database
ISI
SICI code
1051-8223(1997)7:2<1891:IFOTST>2.0.ZU;2-B
Abstract
Attempts to fabricate Tl-based superconducting thin films in-situ were made using a two-zone off-axis rf-sputtering method. The effects of T l2O partial pressure on the phase formation and growth of various Tl-b ased superconducting phases were first investigated by an ex-situ two zone postannealing scheme to simulate the depsoition environ ment of s ubsequent in-situ process. The conditions obtained were then used as g uidelines for in-situ processes. The rf-sputtering system used for in- situ de position is equipped with heating facilities capable of contro lling the temperatures of the substrates and the Tl2O3 source separate ly. Preliminary results indicate that, by varying the substrate temper ature and the partial pressure of Tl2O in a similar manner, Tl-based s uperconducting phases can be obtained in-situ with properties comparab le to those obtained by two-step annealing processes.