RAMAN MICROPROBE ANALYSIS OF PATTERNED TL-2212 THIN-FILMS

We have used MicroRaman spectroscopy to evaluate the effects of ion-mi lling on the exposed edges of patterned Tl2Ba2CaCu2O8 (Tl-2212) lines, Raman microprobe has previously been used to evaluate oxygen loss at the edges of patterned YBCO lines, The results indicated that apprecia ble oxygen loss was caused by ion-milling under certain conditions, Ox ygen loss at the edges will decrease non-uniformly the effective width of the superconducting line, This ran, in turn, impact the electrical characteristics of patterned devices, Using the 633 nm line of a HeNe laser, we have measured the Raman spectrum scanning across patterned and unpatterned regions of several Tl-2212 films with a mapping stage. It is well known that the Raman peak at approximate to 497 cm(-1) cor responds to the Cu-O(2) stretching mode and is correlated with the sup erconducting transition temperature of the material, No appreciable va riation in the center frequency of the Cu-O(2) peak was observed indic ating that thallium cuprate films are not degraded by our patterning p rocess, even at the edges, Variations in the power handling of Tl-2212 co-planar lines, as determined by measurement of the Third Order Inte rcept, were not correlated with the Raman results.