Step bunching on the vicinal GaN(0001) surface

Citation
Mvr. Murty et al., Step bunching on the vicinal GaN(0001) surface, PHYS REV B, 62(16), 2000, pp. R10661-R10664
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
62
Issue
16
Year of publication
2000
Pages
R10661 - R10664
Database
ISI
SICI code
0163-1829(20001015)62:16<R10661:SBOTVG>2.0.ZU;2-A
Abstract
Nominally 2 degrees vicinal GaN(0001) surfaces exhibit monolayer-height ste ps at 990 degreesC in the metal-organic chemical vapor deposition environme nt. Real-time x-ray scattering observations at 715-990 degreesC indicate th at there is a tendency for step bunching during growth. Below 850 degreesC, step bunches nucleated during growth remain and coarsen after growth, whil e above 850 degreesC, the surface reverts to monolayer-height steps after g rowth. Surfaces vicinal toward the {1 (1) over bar 00} and the {11 (2) over bar0} planes exhibit similar behavior. We suggest a simple equilibrium sur face orientational phase diagram for vicinal GaN(0001) that is consistent w ith these observations.