Modelling the dielectrophoresis effect on the transport of neutral molecules in processing plasmas

This article addresses the dynamical behaviour of sputtered neutrals in the strong electric fields arising in industrial plasmas. Such particles are d isplaced from the substrate surface by the impacting plasma ions, and clear ly must be present in the sheath region, directly above the substrate. It i s argued here that the strong electric field gradient at the mouth of trenc h features extracts the neutrals from the vicinity of the substrate, contri buting to the efficient exhausting of the unwanted material. (C) 2000 Elsev ier Science B.V. All rights reserved.