High temperature deformation of a GPS silicon nitride

Citation
S. Testu et al., High temperature deformation of a GPS silicon nitride, REV METALL, 97(9), 2000, pp. 1047
Citations number
17
Categorie Soggetti
Metallurgy
Journal title
Revue de métallurgie
ISSN journal
00351563 → ACNP
Volume
97
Issue
9
Year of publication
2000
Database
ISI
SICI code
Abstract
Compressive creep and stress relaxation tests have been performed in the 14 00-1650 degreesC temperature range on a Gas Pressure Sintered (GPS) silicon nitride. It is a material with a high thermomechanical resistance due to t he absence of intergranular glassy films which commonly reduce the intrinsi c properties of pure Si3N4. Besides, the tensile mechanical behaviour betwe en 1600 and 1680 degreesC shows a non-common stress peak.