A new silicon solar cell structure is presented in which the p-n junction i
s formed by alloying aluminum with n-type silicon, and where this p-n junct
ion is located at the back (unilluminated) side of the cell. With a phospho
rus front diffusion, the resultant n(+) np(+) structure has been implemente
d using dendritic web silicon substrates which are 100 mum thick and doped
with antimony to 20 Omega cm. Such a structure eliminates shunting of the p
-fi junction, provides an effective front surface field, enables a high min
ority carrier lifetime in the base, and is immune to light-induced degradat
ion. Using only production-worthy, high-throughput processes, aluminum allo
y back junction dendritic web cells have been fabricated with efficiencies
up to 14.2% and with corresponding minority carrier (hole) lifetime in the
base of 115 mus. (C) 2001 Elsevier Science B.V. All rights reserved.