Interpreting interfacial structure in cross-sectional STM images of III-V semiconductor heterostructures

Citation
Bz. Nosho et al., Interpreting interfacial structure in cross-sectional STM images of III-V semiconductor heterostructures, SURF SCI, 465(3), 2000, pp. 361-371
Citations number
29
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
465
Issue
3
Year of publication
2000
Pages
361 - 371
Database
ISI
SICI code
0039-6028(20001020)465:3<361:IISICS>2.0.ZU;2-X
Abstract
Using model GaSb-InAs heterostructures, we have systematically examined how cross-sectional scanning tunneling microscopy (XSTM) can be used for the s tudy of III-V heterostructure interfaces. The interpretation of interfacial structure in XSTM images is impeded by the fact that only every other III or V plane as grown on the (001) substrate is seen in each image. We show h ow this structural artifact affects spectral analyses of interfacial roughn ess, preventing an accurate analysis when interfaces are just a few layers wide. Additional complications arise due to the inequivalence of the (110) and (110) cleavage surfaces and the dependence of interfacial bond orientat ion on growth order. By taking advantage of the different bond orientations on the two cleavage surfaces, we demonstrate that the contrast observed at the interfacial layers in this system is caused primarily by the geometry of the interfacial bonds, not electronic structure differences. Finally, we illustrate how careful design of model heterostructures can be used to cir cumvent many limitations of XSTM, and thereby allow one to obtain detailed atomic-scale information about all the growth layers in the structure. (C) 2000 Elsevier Science B.V. All rights reserved.