IR properties of SiO deposited on V1-xWxO2 thermochromic films by vacuum evaporation

In our previous report [Thin Solid Films 281-282 (1996) 232], we designed a new spectral selective radiating material (SSRM) which consists of an SiO film as outer layer, a V1-xWxO2 thermochromic (TC) film as intermediate lay er and blackbody as the substrate, respectively. This SSRM can attain a sta ble surface temperature that can be controlled by varying the value of x of V1-xWxO2, namely the transition temperature, T-c from the metal to semicon ductor phase. In this paper, we report deposition of a SiO him on a V1-xWxO 2 film on glass substrate and its LR spectral reflectance at lower and high er temperature than T-c. We also report an estimated radiative cooling powe r of the SSRM based on the measured IR spectral reflectance and a discussio n concerning the temperature stability of the SSRM. (C) 2000 Elsevier Scien ce S.A. All rights reserved.