Fabrication of iridium field emitter arrays

Citation
Br. Chalamala et al., Fabrication of iridium field emitter arrays, APPL PHYS L, 77(20), 2000, pp. 3284-3286
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
20
Year of publication
2000
Pages
3284 - 3286
Database
ISI
SICI code
0003-6951(20001113)77:20<3284:FOIFEA>2.0.ZU;2-S
Abstract
Iridium field emitter arrays were fabricated using Spindt tip process. Ir f ield emitter cones show an aspect ratio of 0.95, slightly less than Mo fiel d emitter arrays fabricated using the same microfabrication process. When c ompared to the Mo field emitter arrays, the current-voltage characteristics of the Ir arrays were found to scale with the work function difference bet ween Ir and Mo. Under ultrahigh vacuum conditions, the emission current sta bility of the Ir arrays measured over 180 h was found to be similar or slig htly better than the emission stability of Mo arrays. However, when operate d in the presence of O-2, Ir field emitter arrays proved to be more robust and showed improved emission current stability versus their Mo counterparts . (C) 2000 American Institute of Physics. [S0003-6951(00)03946-2].