A SEMI-AQUEOUS PROCESS FOR REMOVING MASKING WAX USED DURING PLATING OPERATIONS

Authors
Citation
Sb. Hayes, A SEMI-AQUEOUS PROCESS FOR REMOVING MASKING WAX USED DURING PLATING OPERATIONS, Plating and surface finishing, 84(7), 1997, pp. 29-32
Citations number
NO
Categorie Soggetti
Metallurgy & Metallurigical Engineering","Materials Science, Coatings & Films
ISSN journal
03603164
Volume
84
Issue
7
Year of publication
1997
Pages
29 - 32
Database
ISI
SICI code
0360-3164(1997)84:7<29:ASPFRM>2.0.ZU;2-T
Abstract
Masking wax removal from plated aircraft components has historically b een performed in vapor degreasers using chlorinated solvents. Many of the alternative processes and chemistries that have been proposed have produced unsatisfactory results in one way or another. This edited ve rsion of a paper presented at the 33rd Aerospace/Airline Plating & Met al Finishing Forum & Exposition at San Francisco, CA, describes a proc ess that has been implemented in several manufacturing facilities in t he aerospace industry with excellent results, The process is also appl icable to other plating operations, not just limited to the aerospace industry.