RING ETCHING ZONES ON MAGNETRON SPUTTERING TARGETS

Citation
G. Golan et A. Axelevitch, RING ETCHING ZONES ON MAGNETRON SPUTTERING TARGETS, Thin solid films, 300(1-2), 1997, pp. 72-77
Citations number
14
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
300
Issue
1-2
Year of publication
1997
Pages
72 - 77
Database
ISI
SICI code
0040-6090(1997)300:1-2<72:REZOMS>2.0.ZU;2-2
Abstract
A practical and theoretical investigation into a method for estimating the forms and dimensions of etching zones on magnetron sputtering tar gets is presented. This estimation is based on detailed geometry consi derations of the internal arrangement of the vacuum chamber and the sp uttering parameters. It is proved theoretically and experimentally tha t etching zones on sputtering targets are in a ring shape and that the ir location and dimensions are independent on the target material or d imensions. (C) 1997 Elsevier Science S.A.