STRUCTURAL MODELS FOR EPITAXY OF HEXAGONAL PHASES OF BORON-NITRIDE ONSI(001)

Authors
Citation
Ws. Verwoerd, STRUCTURAL MODELS FOR EPITAXY OF HEXAGONAL PHASES OF BORON-NITRIDE ONSI(001), Thin solid films, 300(1-2), 1997, pp. 78-83
Citations number
12
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
300
Issue
1-2
Year of publication
1997
Pages
78 - 83
Database
ISI
SICI code
0040-6090(1997)300:1-2<78:SMFEOH>2.0.ZU;2-F
Abstract
Interface models for matching either w-BN or h-BN layers to an Si(001) substrate, are considered. Aligning the [2 - 1 - 10] direction of h-B N (or equivalently the [- 1 - 120] direction in w-BN) along [1 - 10] o f the Si(001), chemical saturation of interface bonds can be achieved. For h-BN, orientations of the basal plane parallel and perpendicular to the surface are both considered. The total energy of atomic cluster s constructed to represent these models, are calculated using the AMl quantum chemical Hamiltonian, and atomic geometries optimised allowing full symmetric relaxation of interface atoms. Only the perpendicular h-BN basal plane model is found to be energetically favourable compare d to earlier calculations for cubic boron nitride. (C) 1997 Published by Elsevier Science S.A.