ZN DIFFUSION OF IN0.5GA0.5P INVESTIGATED BY PHOTOLUMINESCENCE MEASUREMENTS

Citation
It. Yoon et al., ZN DIFFUSION OF IN0.5GA0.5P INVESTIGATED BY PHOTOLUMINESCENCE MEASUREMENTS, Thin solid films, 300(1-2), 1997, pp. 284-288
Citations number
31
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
300
Issue
1-2
Year of publication
1997
Pages
284 - 288
Database
ISI
SICI code
0040-6090(1997)300:1-2<284:ZDOIIB>2.0.ZU;2-H
Abstract
Zn diffusion of an In0.5Ga0.5P layer grown on semi-insulating GaAs sub strate by the liquid phase epitaxy technique has been investigated usi ng photoluminescence (PL) measurements. The PL spectrum shows a charac teristic emission peak of In0.5Ga0.5P at 1.934 eV after diffusion. Fro m temperature-dependent studies of this peak and depth profiling of th is luminescence, it was found that this peak behaves like D-A (donor-a cceptor) pair recombination and is associated with the interstitial Zn donor to substitutional Zn acceptor band transition. Also it was foun d that recombination due to interstitial Zn donor is dominant near the surface and decreases with increasing depth. The calculated activatio n energy of substitutional acceptor was found to be 47 meV. (C) 1997 E lsevier Science S.A.