The cementation test as previously used to investigate defects in sing
le metal nitride PVD coatings has been extended to the study of the ne
w generation of mixed nitride coatings by its application to the study
of defects in TiAlN coatings. Copper cementation tests carried out in
a solution containing 0.1 g l(-1) of copper at pH 1.1 showed that the
incidence of defects in TiAlN lay in between that found in the TiN an
d CrN coatings examined. A detailed cementation mechanism is given whi
ch explains the formation of copper deposits on the surface of PVD coa
tings rather than being confined to within the pores and defects in co
atings. It is suggested that cementation tests might be used to advant
age as a quality control tool to give an early indication of an above
average incidence of defects within a batch of recently coated compone
nts. (C) 1997 Elsevier Science Ltd.