Low-temperature photodarkening of the AsxSe100-x system prepared by PECVD

Citation
P. Nagels et al., Low-temperature photodarkening of the AsxSe100-x system prepared by PECVD, MATER LETT, 46(4), 2000, pp. 234-238
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS LETTERS
ISSN journal
0167577X → ACNP
Volume
46
Issue
4
Year of publication
2000
Pages
234 - 238
Database
ISI
SICI code
0167-577X(200011)46:4<234:LPOTAS>2.0.ZU;2-M
Abstract
Films of the amorphous AsxSe100-x system were prepared by plasma-enhanced c hemical vapor deposition (PECVD) using different gas ratios of the hydrides , AsH3 and H2Se. In the Se-rich region the optical bandgap decreased with i ncreasing As content, in agreement with measurements made on films prepared by evaporation. The temperature dependence of the optical gap (77-300 K) c ould be described by Fan's one-phonon approximation, indicating that electr on-phonon interaction (thermal disorder) plays the most important role. Mea surements of photodarkening at 77 K showed that the decrease of the optical gap and the slope of the Tauc plot are intercorrelated. The kinetics of th e photoinduced shift could be best described by a stretched-exponential law . (C) 2000 Elsevier Science B.V. All rights reserved.