Preparation of sputter-deposited Fe-Pd thin films

Citation
Z. Wang et al., Preparation of sputter-deposited Fe-Pd thin films, MATER T JIM, 41(9), 2000, pp. 1139-1141
Citations number
11
Categorie Soggetti
Metallurgy
Journal title
MATERIALS TRANSACTIONS JIM
ISSN journal
09161821 → ACNP
Volume
41
Issue
9
Year of publication
2000
Pages
1139 - 1141
Database
ISI
SICI code
0916-1821(200009)41:9<1139:POSFTF>2.0.ZU;2-X
Abstract
Fe-30 mol%Pd alloys may combine two abilities, a shape memory effect caused by the fcc-fct structural phase transformation and a magnetostriction effe ct. Therefore Fe-30 mol%Pd alloy thin films are expected to be applied as m agnetic shape memory micro actuators. In this study Fe-30 mol%Pd alloy thin films were prepared on quartz substrates by RF magnetron sputtering. The e ffects of substrate temperature, sputtering power and solution treatment on the crystal structure were investigated The (gamma ,Fe, Pd) phase (fcc str ucture) was obtained either when the sputtering power was above 300W, or wh en the thin films were deposited at 100W and solution-treated at 973 K for 60 s. Furthermore, the magnetic properties of the solution-treated films we re examined.