Roughness evolution of ion sputtered rotating InP surfaces: Pattern formation and scaling laws

The topography evolution of simultaneously rotated and Ar+ ion sputtered In P surfaces was studied using scanning force microscopy. For certain sputter conditions, the formation of a highly regular hexagonal pattern of close-p acked mounds was observed with a characteristic spatial wavelength which in creases with sputter time t according to lambda similar to t(gamma) with ga mma similar or equal to 0.26. Based on the analysis of the dynamic scaling behavior of the surface roughness, the evolution of the surface topography will be discussed within the limits of existing models for surface erosion by ion sputtering.