Electrochemical behaviour of alkaline copper complexes

Citation
Cl. Aravinda et al., Electrochemical behaviour of alkaline copper complexes, P I A S-CH, 112(5), 2000, pp. 543-550
Citations number
8
Categorie Soggetti
Chemistry
Journal title
PROCEEDINGS OF THE INDIAN ACADEMY OF SCIENCES-CHEMICAL SCIENCES
ISSN journal
02534134 → ACNP
Volume
112
Issue
5
Year of publication
2000
Pages
543 - 550
Database
ISI
SICI code
0253-4134(200010)112:5<543:EBOACC>2.0.ZU;2-L
Abstract
A search for non-cyanide plating baths for copper resulted in the developme nt of alkaline copper complex baths containing trisodium citrate [TSC] and triethanolamine [TEA]. Voltammetric studies were carried out on platinum to understand the electrochemical behaviour of these complexes. In TSC soluti ons, the deposition of copper involves the slow formation of a monovalent s pecies. Adsorption of this species obeys Langmuir isotherm. in TEA solution s the deposition involves the formation of monovalent ions obeying the non- activated Temkin isotherm. Conversion of divalent to monovalent copper is a lso slow, in TEA and TSC alkaline copper solutions, the predominant species that undergo stepwise reduction contain only TEA ligands.