LOGARITHMIC DEPENDENCE OF THE SURFACE ANISOTROPY ON THE LOW-ANGLE X-RAY-DIFFRACTION INTENSITY IN CO-BASED MULTILAYERS

Authors
KIM JH SHIN SC
Citation
Jh. Kim et Sc. Shin, LOGARITHMIC DEPENDENCE OF THE SURFACE ANISOTROPY ON THE LOW-ANGLE X-RAY-DIFFRACTION INTENSITY IN CO-BASED MULTILAYERS, Thin solid films, 301(1-2), 1997, pp. 249-252
Citations number
16
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
301
Issue
1-2
Year of publication
1997
Pages
249 - 252
Database
ISI
SICI code
0040-6090(1997)301:1-2<249:LDOTSA>2.0.ZU;2-Y
Abstract
We have investigated the dependence of the surface anisotropy on the i nterfacial microstructure in Co/Pd and Co/Pt multilayers prepared by s puttering. The interfacial microstructure of multilayers was manipulat ed by changing sputtering Ar gas pressure in the preparation of sample s. The surface anisotropy of Co/Pd and Co/Pt multilayers was sensitive ly dependent on the interfacial microstructural modification and the s urface anisotropy of those multilayers was found to be logarithmically dependent on the integrated low-angle X-ray diffraction intensity.